Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......
CMP Tribo 臺式化學機械研磨拋光設備,The Tribo CMP system is a precision engineered, bench top solution designed with one thing in mind - the research of wafer processes
The Logitech DP high speed polishing systems have been designed for semi automated ?nal stage polishing of hard materials, such as sapphire, silicon carbide or gallium nitride, to epitaxy ready qualit
The Logitech DL precision lapping systems process materials with high geometric precision. These systems can process up to 4, 200mm/8” Ø samples （or multiple smaller samples） simultaneously.
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